標題: ASTM F 2113-2001 薄膜電子設備用高純度金屬濺涂靶雜... [打印本頁] 作者: 兌水 時間: 2009-12-6 16:40 標題: ASTM F 2113-2001 薄膜電子設備用高純度金屬濺涂靶雜... F2113-01e1 Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications